Surface morphology of Nafion 117 membrane by tapping mode atomic force microscope

Author(s):  
A. Lehmani ◽  
S. Durand-Vidal ◽  
P. Turq
2019 ◽  
Vol 86 (s1) ◽  
pp. 12-16
Author(s):  
Janik Schaude ◽  
Julius Albrecht ◽  
Ute Klöpzig ◽  
Andreas C. Gröschl ◽  
Tino Hausotte

AbstractThis article presents a new tilting atomic force microscope (AFM) with an adjustable probe direction and piezoresistive cantilever operated in tapping-mode. The AFM is based on two rotational axes, which enable the adjustment of the probe direction to cover a complete hemisphere. The whole setup is integrated into a nano measuring machine (NMM-1) and the metrological traceability of the piezoresistive cantilever is warranted by in situ calibration on the NMM-1. To demonstrate the capabilities of the tilting AFM, measurements were conducted on a step height standard.


2013 ◽  
Vol 378 ◽  
pp. 466-471
Author(s):  
Po Jen Shih ◽  
Shang Hao Cai

The dynamic behaviors of carbon nanotube probes applied in Atomic Force Microscope measurement are of interest in advanced nanoscalar topography. In this paper, we developed the characteristic equations and applied the model analysis to solve the eigenvalues of the microcantilever and the carbon nanotube. The eigenvalues were then used in the tapping mode system to predict the frequency responses against the tip-sample separations. It was found that the frequency drop steeply if the separation was less than certain distances. This instability of frequency is deduced from the jump of microcantilever or the jump of the carbon nanotube. Various lengths and binding angles of the carbon nanotube were considered, and the results indicated that the binding angle dominated the frequency responses and jumps.


2008 ◽  
Vol 74 (742) ◽  
pp. 1409-1415
Author(s):  
Masatoshi NUMATSU ◽  
Andrew J. DICK ◽  
Hiroshi YABUNO ◽  
Masaharu KURODA ◽  
Balakumar BALACHANDRAN

2014 ◽  
Vol 25 (6) ◽  
pp. 732-740 ◽  
Author(s):  
Kleber dos Santos Rodrigues ◽  
José Manoel Balthazar ◽  
Angelo Marcelo Tusset ◽  
Bento Rodrigues de Pontes ◽  
Átila Madureira Bueno

Author(s):  
Kleber dos Santos Rodrigues ◽  
José Manoel Balthazar ◽  
Angelo Marcelo Tusset ◽  
Bento Rodrigues de Pontes Junior

2006 ◽  
Vol 73 (15) ◽  
Author(s):  
János Kokavecz ◽  
Othmar Marti ◽  
Péter Heszler ◽  
Ádám Mechler

1992 ◽  
Vol 280 ◽  
Author(s):  
Rama I. Hegde ◽  
Mark A. Chonko ◽  
Philip J. Tobin

ABSTRACTThe growth and surface morphology of thin LPCVD silicon films were investigated with an atomic force microscope (AFM). Silicon films of 30 nm thicknesses were deposited on SiO2 using SiH4 at four different temperatures between 550 °C and 625 °C. These AFM results permitted visualization of silicon surface granularity, roughness, and the transition with temperature from amorphous to crystalline structure between 550 °C and 580 °C. The surface of the amorphous film deposited at 550 °C is very smooth and the film is continuous physically, while the film formed at 580 °C appears crystalline, rough and porous. At 600 °C and 625 °C the films are fully crystalline. For these higher temperature films surface roughness and the average grain size decreased significantly compared to 580 °C film. Crystallinity and film continuity were further examined by x-ray diffraction (XRD) and cross-sectional TEM measurements.


Sign in / Sign up

Export Citation Format

Share Document